Servicenavigation

Detailseite

Zurück

Projekt Druckansicht

DFG-RSF: Beryllium-basierte Vielschichtstrukturen für den EUV-Bereich

Antragsteller Dr. Andrey Sokolov
Fachliche Zuordnung Optik, Quantenoptik und Physik der Atome, Moleküle und Plasmen
Förderung Förderung von 2016 bis 2020
Projektkennung Deutsche Forschungsgemeinschaft (DFG) - Projektnummer 310360704
 
Erstellungsjahr 2020

Zusammenfassung der Projektergebnisse

The expertise of two world-standard facilities of high reputation was merged in this project: (1) Institute for Physics of Microstructure of the Russian Academy of Science (IPM-RAS), Nizhny Novgorod, which owns a well-equipped laboratory for XUV-multilayer optics fabrication and (2) the synchrotron radiation facility BESSY-II with a state-of-the-art At-Wavelength Metrology station to characterize such optical elements. The goal of this project was the development, characterization and application of novel types of multilayer stacks with promising innovative properties, namely beryllium (Be)-containing optical devices to be used in the VUV, EUV, and soft x-ray region for various applications. The high scientific, optical and technological interest in this material contrasts to the limited experimental data set available. This is due to the high toxicity of Be and the special laboratory certification required to handle this material, which was only recently acquired at the laboratory of our partners in Nizhny Novgorod. We identified three main areas of potential applications, for which Be-optics might be superior to the commonly used optical approaches: EUV-lithography optics; Optics for astronomy; High-pass filter optics. In all of these cases simulations on the basis of the available optical constants had demonstrated already clearly their improved performance. Since experimental data on the optical behavior of Be is scarce, the project started by determining it’s optical constants in the UV-, VUV and EUV-range of interest and by development of an analytical, self-calibrating approach to describe the manufactured (multi- )layer stacks as a depth-profile of the electron density on the basis of a global fit to the experimental reflectivity and transmission data. For all of the above mentioned application fields the project was more than successful and resulted up to now in nine publications in peer-reviewed journals. The results for reflectivity, transmission, thermal (long-term) stability etc. exceeded our expectations. Remaining discrepancies between simulated (expected) and measured results could be clearly traced to boundary (interface) inhomogeneity which are in turn described by the global fit model as well. Some highlights of the project results are the following: 1) Outstanding optical properties of Be/Al multilayers in the UV-range. 2) Mo/Be multilayer with C, B4C, and Si interlayers – better interfaces. 3) Freestanding Be-containing membranes - long term stability. 4) Be-containing multilayer mirrors for EUV-lithography – record reflectivity. 5) Heat load on mirrors - annealing of Mo/Be multilayers – improved performance.

Projektbezogene Publikationen (Auswahl)

 
 

Zusatzinformationen

© 2024 DFG Kontakt / Impressum / Datenschutz

Textvergrößerung und Kontrastanpassung