Layered structures of Metal Sulphides
Final Report Abstract
This project aimed at developing a sputter-deposition method for deposition of high quality 2 dimensional (2D) sulphides, such as WS2, MoS2, SnS2 and combinations thereof. Such materials combinations constitute novel 2D materials. The deposited 2D films are characterised by using optical microscopy, atomic force microscopy (AFM), transmission electron microscopy (TEM), X-ray diffraction (XRD), Rutherford Backscattering (RBS), Raman and photoluminescence (PL) spectroscopies, X-ray photoelectron spectroscopy (XPS) and hard X-ray photoelectron spectroscopy. A thorough characterisation is important for understanding the fundamental physics of the 2D structures. Further, deposition and analysis of the proposed 2D materials is necessary to assess their potential in novel electronics and optoelectronics. The sputter deposition method is chosen since it is a relatively cheap and commonly used deposition process that can be easily scaled up. The possibility of using it for 2D materials would therefore constitute an enormous advantage for the industrial scale production in Europe. More specific purposes and aims of the project are as follows. • Studying and characterising the influence of the energetic particle bombardment associated with sputter deposition onto the proposed 2D-materials. • Developing a sputter deposition process that enables deposition onto the proposed 2D-materials without deteriorating their quality. • Developing a sputter deposition process that enables deposition of high quality layered sulphide films, such as WS2, MoS2, SnS2, and novel combinations thereof. • Characterising the sputtered 2D-materials films and evaluating them from a fundamental standpoint, e.g. correlation of the structural aspects (crystal structure and defects) with fundamental properties. The project has included sputter deposition of films of WS2, MoS2, WS2/MoS2 and WS2/SnS2. A systematic study on how the processing parameters influence the films quality/properties has been carried out. The study has covered a wider range of processing parameters (e.g. processing gas mixture, substrate temperature, target composition) as compared to any previous study. It has been demonstrated that high quality WS2 and MoS2 films can be deposited by adjusting the processing parameters. The high quality 2D structure has been demonstrated for WS2 and MoS2 films ranging in thickness from one monolayer (ML) up to several tens of nanometers. In the project, we have uniformly sputter deposited a one ML thick WS2 and MoS2 films over an area of at least 6*6 cm. The large area sputter deposition of single ML films of WS2 and MoS2 are unique and the mixed 2D films of 2D WS2/MoS2 and SnS2/WS2 films are novel 2D materials that have previously not been deposited by means of sputtering.
Publications
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Sputtered High Quality Two Dimensional Metal Sulphide Films. Invited to the 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019) in Jeju, Korea, 1-5 Sep, 2019
M. Villamayor & T. Nyberg
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Sputtering Damages in Metal Sulphide Dichalcogenides. IVC-21, 1st-5th July 2019, Malmö, Sweden
Witkowski, P. Lourenco, K. Zhang, H. Cruguel, R. Bernard, G. Prévot, M. Villamayor & T. Nyberg
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Sputtering of two dimensional metal sulphide films. Invited to the 7th International Workshop on Nanotechnology and Application in Phan Thiet, Vietnam, 6-9 November, 2019, (IWNA 2019) and published in 7th International Workshop on Nanotechnology and Application Conference Proceedings 2019, pp 65-67
T. Nyberg
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Sputtered Highly Oriented Two Dimensional Metal Sulphide Films. Invited to the International Symposium of the Vacuum Society of the Philippines (ISVSP 2020) in Cebu, Philippines, January 8- 10, 2020
M. Villamayor & T. Nyberg
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Synthesis and defect creation in Metal Sulphide Dichalcogenides. JSI2020, 22-24 January 2020, Paris, France
P. Lourenço, R. Bernard, H.Cruguel, G. Prévot, N. Witkowski, M. Villamayor & T. Nyberg
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Growth of two-dimensional WS2 thin films by reactive sputtering. Vacuum, 188, 110205.
Villamayor, Michelle Marie S.; Lindblad, Andreas; Johansson, Fredrik O.L.; Tran, Tuan; Pham, Ngan Hoang; Primetzhofer, Daniel; Sorgenfrei, Nomi L.A.N.; Giangrisotomi, Erika; Föhlisch, Alexander; Lourenço, Pedro; Bernard, Romain; Witkowski, Nadine; Prévot, Geoffroy & Nyberg, Tomas
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Substrate Effects on Crystal Phase in Atomic Layer Deposition of Tin Monosulfide. Chemistry of Materials, 33(8), 2901-2912.
Bilousov, Oleksandr V.; Voznyi, Andrii; Landeke-Wilsmark, Björn; Villamayor, Michelle Marie S.; Nyberg, Tomas & Hägglund, Carl
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Wafer-sized WS2 monolayer deposition by sputtering. Nanoscale, 14(17), 6331-6338.
Villamayor, Michelle Marie S.; Husain, Sajid; Oropesa-Nuñez, Reinier; Johansson, Fredrik O. L.; Lindblad, Rebecka; Lourenço, Pedro; Bernard, Romain; Witkowski, Nadine; Prévot, Geoffroy; Sorgenfrei, Nomi L. A. N.; Giangrisostomi, Erika; Föhlisch, Alexander; Svedlindh, Peter; Lindblad, Andreas & Nyberg, Tomas
