Project Details
Projekt
In-situ low temperature electron-beam lithography system
Subject Area
Condensed Matter Physics
Term
Funded in 2019
Project identifier
Deutsche Forschungsgemeinschaft (DFG) - Project number 417431145
The structuring of materials with a high lateral resolution in the nanometer range and in combination with a deterministic technology is of largest importance for the development and fabrication of low dimensional semiconductor structures and for their application in nanophotonics and quantum optics. For this purpose, in-situ electron-beam lithography as a deterministic and forward-looking nanotechnology platform has been developed in the last five years. This advanced nanotechnology platform combines low-temperature cathodoluminescence spectroscopy for a highly precise spatial and spectral selection of single emitters with subsequent low-temperature electron-beam lithography for the definition of structures. It was successfully applied for a number of scientific advancements. Single quantum dots were integrated into efficient single-photon emitting devices and on-chip waveguide structures by means of a deterministic spectral and spatial selection with a high device yield. The present in-situ electron-beam lithography setup consists of a 33 years old scanning electron microscope with a home-made cathodoluminescence-spectroscopy and electron-beam lithography functionality. A forward-looking use of this setup is no longer possible as the writing-field size and lateral resolution are too limited. There is no interferometer table available and no possibility for an offset-free writing of larger structures. Furthermore, the manufacturer has finished its support for this device in the year 2014. Further improvements and a guaranteed operational reliability, can only be achieved by a state-of-the-art and high-resolution in-situ electron-beam lithography system that has an interferometer table and a stichless writing mode for larger structures. Besides its deterministic electron-beam lithography for the realization of photonic quantum devices, this machine which can also be used for standard electron-beam lithography will provide totally new high-resolution nanofabrication capabilities to the for all participating working groups.
DFG Programme
Major Research Instrumentation
Major Instrumentation
In-situ Tieftemperatur Elektronenstrahl-Lithographie System
Instrumentation Group
0910 Geräte für Ionenimplantation und Halbleiterdotierung
Applicant Institution
Technische Universität Berlin
