Project Details
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Novel Planar Slow-Wave Structures for High-Power Broadband Millimeter and THz-band Traveling-Wave Tubes

Subject Area Electronic Semiconductors, Components and Circuits, Integrated Systems, Sensor Technology, Theoretical Electrical Engineering
Term from 2020 to 2024
Project identifier Deutsche Forschungsgemeinschaft (DFG) - Project number 430109039
 
Final Report Year 2024

Final Report Abstract

Miniaturization and availability of vacuum electron devices is crucial in millimeter-wave applications, such as radar, wireless and satellite communication. Today vacuum technologies are cost intensive and limited in their manufacturing processes for higher market volumes. It is necessary explore new fabrication methods for vacuum electronic devices that operate over 100 GHz. The key driver for the exploration is the slow-wave structure (SWS) fabrication. The traditional SWS is difficult to manufacture due to its 3D character, its demands for micron precision at millimeter-waves for all three dimensions and at the same time geometrical dimensions of several centimeters. On the other hand, 2D planar SWS structures can be realized by photolithographic techniques, which solve the manufacturing limitations at the expense of high losses, narrow bandwidth and limited performance of the vacuum device. The objective of this proposal is to explore novel 2D structures, which could overcome the above limitations and pave the way towards efficient SWS manufacturing and travelling-wave tube realization at millimeter-wave frequencies. We propose to improve the state-of-the-art of traveling-wave tubes, based on 2D SWS, both in terms of fabrication complexity and in terms of performances. In particular, this project aims to provide a novel solution for a high power TWT amplifier, operating around 220 GHz with more than 10 GHz bandwidth. This amplifier involves studies on novel 2D planar SWS as an alternative to the narrow bandwidth Meander lines studied earlier, considering both single and multilayer substrates. Photolithographic techniques enable reliable fabrication of such SWS with high precision and repeatability at a fraction of the manufacturing costs. Theoretical and simulation studies have been performed on these SWS structures with the aim of band-width and coupling impedance optimization. Experimental characterization of these structures has been validated through simulations. The success of the project is based on a strong collaboration and synergy between the two groups. The two groups use complementary design approaches and different electromagnetic simulators. They exchanged the results and design models of the studied architectures and systematically evaluated the structures for their performance capabilities. The two groups have fabricated the SWS devices using different fabrication approaches. In particular, GUF has been in charge of the fabrication of single and multilayer SWS structures with standard optical lithography, while Saratov team was investigating SWS devices through laser machining. The project resulted in a number of publications in international refereed journals and international conferences specialized in the topic (e.g. IVEC).

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