Ferroelectric zirconium oxide for piezo- and pyroelectric devices (Zeppelin)
Synthesis and Properties of Functional Materials
Final Report Abstract
The Zeppelin project’s primary goals were to make significant strides in the theoretical and experimental understanding of ferroelectricity, pyroelectricity, and piezoelectricity in ZrO 2 and Zr-rich Hf1-xZrxO2. In the context of the current state of the field of fluorite-structured ferroelectrics, ZrO2 is in general less studied and less well-understood than HfO2. Notably, the predominant tendency of ZrO2 to exhibit antiferroelectric behavior in thin film form distinguishes it from HfO2 and has considerable implications ferro-, piezo-, and pyroelectric devices. The origin of antiferroelectricity and its influence on the electrically active properties of ZrO2 films were objects of theoretical and experimental investigation within the project. On the experimental side, various film deposition techniques such as ALD, PVD, and CSD were used to grow ZrO2 and Hf1-xZrxO2. Growing thick ZrO2 films, which can be advantageous for sensing and actuating applications, were limited in ALD and PVD processes due to the growth of the undesirable low-k monoclinic phase, which could be overcome by using CSD. Process dependencies on the oxygen content and doping significantly impact the ZrO2 ferroelectric and pyroelectric, broadly transferrable to commercial applications, including memories and sensors. Piezoresponse force microscopy measurements confirmed the genuine antiferroelectric response of ZrO2, and the first images of the local piezoresponse of electric field-induced phase transitions were demonstrated. The use of Raman spectroscopy to unambiguously distinguish the polar orthorhombic from the nonpolar tetragonal phases in 45 nm ZrO2 film marks a significant experimental milestone in quantifying the phases in relatively thin fluorite films. This approach could also confirm the irreversible tetragonal to polar orthorhombic phase transition with wake-up cycling in ZrO2. Progress was made in better understanding the stress and strain dependency of ferroelectricity in ZrO2 films, which can be further built upon in future studies. Different to the ALD and PVD case, thick ferroelectric layers of undoped and Y-doped doped ZrO2 up to 500nm could be produced by CSD. With theoretical calculations, the polymorphism of ZrO2 was thoroughly investigated, and two unidentified low-energy phases were found so far. For doped ZrO2, only a small window for the support of the polar phase compared to the tetragonal phase was found. Oxygen interstitials substantially destabilized the tetragonal phase, reducing the kinetic energy barrier. The piezo- and pyroelectric constants were very different, genuinely negative, and large and positive, close to the phase transition. The Zeppelin project has significantly contributed to the knowledge of the ferroelectric, piezoelectric, and pyroelectric properties of ZrO2-based films. A number of follow-up investigations appear promising for further understanding and exploiting these properties for memory, neuromorphic, and sensing applications.
Publications
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Influence of Oxygen Content on the Structure and Reliability of Ferroelectric HfxZr1–xO2 Layers. ACS Applied Electronic Materials, 2(11), 3618-3626.
Materano, Monica; Mittmann, Terence; Lomenzo, Patrick D.; Zhou, Chuanzhen; Jones, Jacob L.; Falkowski, Max; Kersch, Alfred; Mikolajick, Thomas & Schroeder, Uwe
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Optimizing the Piezoelectric Strain in ZrO2- and HfO2-Based Incipient Ferroelectrics for Thin-Film Applications: An Ab Initio Dopant Screening Study. ACS Applied Materials & Interfaces, 12(29), 32915-32924.
Falkowski, Max & Kersch, Alfred
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Universal Curie constant and pyroelectricity in doped ferroelectric HfO2 thin films. Nano Energy, 74, 104733.
Lomenzo, Patrick D.; Jachalke, Sven; Stoecker, Hartmut; Mehner, Erik; Richter, Claudia; Mikolajick, Thomas & Schroeder, Uwe
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Ab initio interphase characteristics in HfO2 and ZrO2 and nucleation of the polar phase. Applied Physics Letters, 118(3).
Falkowski, Max & Kersch, Alfred
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An unexplored antipolar phase in HfO2 from first principles and implication for wake-up mechanism. Applied Physics Letters, 119(8).
Azevedo, Antunes Luis; Ganser, Richard; Alcala, Ruben; Mikolajick, Thomas; Schroeder, Uwe & Kersch, Alfred
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Interplay between oxygen defects and dopants: effect on structure and performance of HfO2-based ferroelectrics. Inorganic Chemistry Frontiers, 8(10), 2650-2672.
Materano, Monica; Lomenzo, Patrick D.; Kersch, Alfred; Park, Min Hyuk; Mikolajick, Thomas & Schroeder, Uwe
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New Low‐Energy Crystal Structures in ZrO2 and HfO2. physica status solidi (RRL) – Rapid Research Letters, 15(5).
Kersch, Alfred & Falkowski, Max
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Pyroelectric dependence of atomic layer-deposited Hf0.5Zr0.5O2 on film thickness and annealing temperature. Applied Physics Letters, 119(11).
Lomenzo, Patrick D.; Alcala, Ruben; Richter, Claudia; Li, Songrui; Mikolajick, Thomas & Schroeder, Uwe
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Stabilizing the ferroelectric phase in HfO2-based films sputtered from ceramic targets under ambient oxygen. Nanoscale, 13(2), 912-921.
Mittmann, Terence; Michailow, Michail; Lomenzo, Patrick D.; Gärtner, Jan; Falkowski, Max; Kersch, Alfred; Mikolajick, Thomas & Schroeder, Uwe
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Characteristics of Low‐Energy Phases of Hafnia and Zirconia from Density Functional Theory Calculations. physica status solidi (RRL) – Rapid Research Letters, 16(10).
Azevedo, Antunes Luis; Ganser, Richard; Kuenneth, Christopher & Kersch, Alfred
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Influence of Si-Doping on 45 nm Thick Ferroelectric ZrO2 Films. ACS Applied Electronic Materials, 4(7), 3648-3654.
Xu, Bohan; Lomenzo, Patrick D.; Kersch, Alfred; Mikolajick, Thomas & Schroeder, Uwe
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Investigating charge trapping in ferroelectric thin films through transient measurements. Frontiers in Nanotechnology, 4.
Lancaster, Suzanne; Lomenzo, Patrick D.; Engl, Moritz; Xu, Bohan; Mikolajick, Thomas; Schroeder, Uwe & Slesazeck, Stefan
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Memory Window Enhancement in Antiferroelectric RAM by Hf Doping in ZrO₂. IEEE Electron Device Letters, 43(9), 1447-1450.
Lomenzo, Patrick D.; Li, Songrui; Pintilie, Lucian; Istrate, Cosmin M.; Mikolajick, Thomas & Schroeder, Uwe
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Piezo- and Pyroelectricity in Zirconia: A Study with Machine-Learned Force Fields. Physical Review Applied, 18(5).
Ganser, Richard; Bongarz, Simon; von Mach, Alexander; Azevedo, Antunes Luis & Kersch, Alfred
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Simulation of XRD, Raman and IR spectrum for phase identification in doped HfO2 and ZrO2. Frontiers in Nanotechnology, 4.
Kersch, Alfred; Ganser, Richard & Trien, Maximilian
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Temperature‐Dependent Phase Transitions in HfxZr1‐xO2 Mixed Oxides: Indications of a Proper Ferroelectric Material. Advanced Electronic Materials, 8(9).
Schroeder, Uwe; Mittmann, Terence; Materano, Monica; Lomenzo, Patrick D.; Edgington, Patrick; Lee, Young H.; Alotaibi, Meshari; West, Anthony R.; Mikolajick, Thomas; Kersch, Alfred & Jones, Jacob L.
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Using Raman spectroscopy and x-ray diffraction for phase determination in ferroelectric mixed Hf1−xZrxO2-based layers. Journal of Applied Physics, 132(21).
Schroeder, Uwe; Sachdeva, Ridham; Lomenzo, Patrick D.; Xu, Bohan; Materano, Monica; Mikolajick, Thomas & Kersch, Alfred
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Discovery of Nanoscale Electric Field‐Induced Phase Transitions in ZrO2. Advanced Functional Materials, 33(41).
Lomenzo, Patrick D.; Collins, Liam; Ganser, Richard; Xu, Bohan; Guido, Roberto; Gruverman, Alexei; Kersch, Alfred; Mikolajick, Thomas & Schroeder, Uwe
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Influence of moisture on the ferroelectric properties of sputtered hafnium oxide thin films. Journal of Applied Physics, 134(18).
Berg, Fenja; Kopperberg, Nils; Lübben, Jan; Valov, Ilia; Wu, Xiaochao; Simon, Ulrich & Böttger, Ulrich
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Influence of the Ozone Dose Time during Atomic Layer Deposition on the Ferroelectric and Pyroelectric Properties of 45 nm-Thick ZrO2 Films. ACS Applied Electronic Materials, 5(4), 2288-2295.
Xu, Bohan; Collins, Liam; Holsgrove, Kristina M.; Mikolajick, Thomas; Schroeder, Uwe & Lomenzo, Patrick D.
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Insights Into Curie‐Temperature and Phase Formation of Ferroelectric Hf1−xZrxO2 with Oxygen Defects from a Leveled Energy Landscape. Advanced Materials Interfaces, 11(2).
Azevedo, Antunes Luis; Ganser, Richard; Schroeder, Uwe; Mikolajick, Thomas & Kersch, Alfred
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Parameters for ferroelectric phase stabilization of sputtered undoped hafnium oxide thin films. Japanese Journal of Applied Physics, 62(1), 015507.
Berg, Fenja; Lübben, Jan & Böttger, Ulrich
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Reduced fatigue and leakage of ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors by thin alumina interlayers at the top or bottom interface. Nanotechnology, 34(12), 125703.
Hsain, H. Alex; Lee, Younghwan; Lancaster, Suzanne; Lomenzo, Patrick D.; Xu, Bohan; Mikolajick, Thomas; Schroeder, Uwe; Parsons, Gregory N. & Jones, Jacob L.
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Reliability Improvement from La2O3 Interfaces in Hf0.5Zr0.5O2‐Based Ferroelectric Capacitors. Advanced Materials Interfaces, 10(8).
Mehmood, Furqan; Alcala, Ruben; Vishnumurthy, Pramoda; Xu, Bohan; Sachdeva, Ridham; Mikolajick, Thomas & Schroeder, Uwe
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Strain as a Global Factor in Stabilizing the Ferroelectric Properties of ZrO2. Advanced Functional Materials, 34(8).
Xu, Bohan; Lomenzo, Patrick D.; Kersch, Alfred; Schenk, Tony; Richter, Claudia; Fancher, Chris M.; Starschich, Sergej; Berg, Fenja; Reinig, Peter; Holsgrove, Kristina M.; Kiguchi, Takanori; Mikolajick, Thomas; Boettger, Ulrich & Schroeder, Uwe
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The Electrode‐Ferroelectric Interface as the Primary Constraint on Endurance and Retention in HZO‐Based Ferroelectric Capacitors. Advanced Functional Materials, 33(43).
Alcala, Ruben; Materano, Monica; Lomenzo, Patrick D.; Vishnumurthy, Pramoda; Hamouda, Wassim; Dubourdieu, Catherine; Kersch, Alfred; Barrett, Nicolas; Mikolajick, Thomas & Schroeder, Uwe
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Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition. Journal of Applied Physics, 133(22).
Hsain, H. Alex; Lee, Younghwan; Lomenzo, Patrick D.; Alcala, Ruben; Xu, Bohan; Mikolajick, Thomas; Schroeder, Uwe; Parsons, Gregory N. & Jones, Jacob L.
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Investigation of the large-signal electromechanical behavior of ferroelectric HfO2–CeO2 thin films prepared by chemical solution deposition. Journal of Applied Physics, 135(9).
Lübben, Jan; Berg, Fenja & Böttger, Ulrich
