Project Details
Projekt
Electron-beam lithography system
Subject Area
Systems Engineering
Term
Funded in 2021
Project identifier
Deutsche Forschungsgemeinschaft (DFG) - Project number 490736786
With the present application we apply for a user-friendly electron beam lithography system with high spatial resolution. The system will enable the applicants' working groups to experimentally implement a wide range of complex nanosystems. An important work focus should be on the fabrication of hybrid photonic and optoelectronic nanostructures. The nanostructures to be realized here are diverse and include for example light-emitting, non-linear and switchable photonic meta-surfaces, hybrid quantum systems, optoelectronic systems based on two-dimensional materials and nanowires, and photonic systems that are decorated with nanostructured responsive materials. Another focus of work is the development of new nanomaterials and nanostructuring processes, such as the development of electron-beam-sensitive responsive polymers, special flexible glasses and nanostructured ion-exchanged surfaces. The system applied for is the ideal tool for the controlled fabrication of hybrid nanostructures based on designs optimized on the computer. In particular, complex nanostructures, which consist of two or more precisely aligned layers and / or different material systems, should also be realized. This precise control is particularly important for hybrid photonic nanostructures, whose functionality is based on a selective near-field interaction of an optically resonant structure with nanoscale matter. For this purpose, the requested system enables multi-stage exposure processes that can be aligned with one another with an accuracy of sub 10 nm using an interferometric sample stage. Another strength of the system is its high flexibility for the exposure of samples with very small or irregular dimensions. This enables the nanostructuring of new materials and / or layered systems that are only available in small quantities. The requested system is therefore ideally suited for method development of new optical and responsive material systems and new nanostructuring processes. The system applied for will be mainly used by five research groups from the Friedrich Schiller University (FSU) Jena, which are based at the Faculty of Physics and Astronomy and the Faculty of Chemistry and Geosciences, but shall in principle be made accessible for all interested research groups of the FSU. In particular, the system will enable various new interdisciplinary collaborations between the research groups using it. All in all, the requested system will significantly strengthen the scientific spectrum of the FSU Jena at the intersection of the two focal points optics and materials science.
DFG Programme
Major Research Instrumentation
Major Instrumentation
Elektronenstrahllithographiesystem
Instrumentation Group
0910 Geräte für Ionenimplantation und Halbleiterdotierung
Applicant Institution
Friedrich-Schiller-Universität Jena
