Confocal DC/RF Magnetron-Sputter-System

• Subject Area: Electrical Engineering and Information Technology
• Term: Funded in 2023
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 515777855

Confocal sputtering (co-sputtering) is a physical vapor deposition (PVD) processes, which allows for deposition of functional heterostructures by means of cathode sputtering using multiple confocally arranged sputter sources. Confocal sputtering differs from classical sputtering in that several sputter sources are operated in simultaneously. Within the scope of this proposal, the procurement of a DC/RF sputtering system with confocally arranged cathodes is requested for the implementation of innovative research projects. Research of the Chair of Micro- and Nanoelectronics is focused on novel semiconducting and functional thin-films and low-dimensional materials, which find application in novel electronic devices, information technology, sensor technology and micro- and nanosystems. The co-sputter system will be an integral part of the technology required to carry out innovative research projects ranging from fundamental to applied science. Unlike conventional sputtering processes, co-sputtering allows not only the sequential deposition of different material layers but also a continuous change of the layer composition with high flexibility. In combination with inert gases, the use of reactive gases such as oxygen or nitrogen offers the possibility of depositing thin layers of oxides and/or nitrides. This combination of process parameters opens up completely new possibilities in the deposition of innovative and functional thin-films. Within the context of future-oriented research projects, heterostructures based on transition metal oxides with tunable stoichiometry and defect density are to be realized. Such material systems find application in the field of novel nanostructured sensors, thermo- and pyroelectrics as well as plasmonics. Furthermore, co-sputtering allows the fabrication of thin-films with complex dopant profiles and in situ controllable dopant concentration, which cannot be realized by classical doping methods. In this way, nanoionic processes can be used in highly integrated memristors for applications in the field of neuromorphics. Within the scope of this proposal, research projects will also be carried out by other users from the departments of electrical engineering and information technology as well as physics within the TU Dortmund and in the future also within the Research Alliance Ruhr. In this way, the deposition system will be a key tool for excellent cross-faculty projects and forms the basis for further interdisciplinary synergies in the medium term.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Konfokales DC/RF Magnetron-Sputter-System
• Instrumentation Group: 8330 Vakuumbedampfungsanlagen und -präparieranlagen für Elektronenmikroskopie
• Applicant Institution: Technische Universität Dortmund
• Leader: Professor Dr.-Ing. Stefan Tappertzhofen