Project Details
Projekt
Elektronenstrahl-Lithographie-System
Subject Area
Systems Engineering
Term
Funded in 2023
Project identifier
Deutsche Forschungsgemeinschaft (DFG) - Project number 525501813
For the fabrication of ultra-high resolution hybrid systems, a precision nanofabrication system is to be procured which allows the realization of planar and three-dimensional nanostructures. The system, consisting of a device for electron beam lithography (EBL) combined with a device for 3D microfabrication (3DMF), will be applied for in the context of W. Pernice's appointment at the University of Heidelberg and will ensure the working proficiency of the group as well as serve as a nucleation point for new research activities in the field of nano- and quantum technology. The precision nanomanufacturing system will be used to realize large-area photonic, electronic and hybrid nanostructures. Planar devices will be lithographically fabricated using EBL, enabling complex wafer-level chip systems via a high clock rate. Within the chip systems, nano- and microstructures with variations over several orders of magnitude are to be combined, with nanostructures with local dimensions below 10 nm embedded within large EBL write fields. For system operation with many users from different workgroups, a fast clock cycle shall enable short write times. Via precision alignment against EBL-manufactured marker structures, 3DMF will enable access to the third dimension, for free-form devices with dimensions well below one micrometer. Crucial for the hybrid integration of chip systems with many individual components is a high degree of parallelization, which will be achieved via 3D laser lithography and grayscale lithography with high surface quality. The combination of the precision manufacturing approaches for 2D and 3D nanostructures will be based on the concept for Photonic Computer Aided Design (PCAD) used in the Pernice group, which allows to flexibly combine both manufacturing methods in a common layout language. The precision nanomanufacturing system will be embedded in the existing infrastructure for nanomanufacturing at Heidelberg University. The nanomanufacturing resources available at the Kirchhoff Institute of Physics (KIP), the European Institute for Neuromorphic Computing (EINC), the Institute for Molecular Systems Engineering and Advanced Materials (IMSEAM) and the Institute of Computer Engineering (ZITI) will also be used jointly by research groups from the neighboring Institute of Physics and the STRUCTURES and 3DMM2O clusters of excellence. Thus, the new infrastructure will be available to a wide range of users, which will be continuously expanded. The system will be operated as a multi-user device and decisively strengthen the possibilities for precision nanomanufacturing at Heidelberg University.
DFG Programme
Major Research Instrumentation
Major Instrumentation
Elektronenstrahl-Lithographie-System
Instrumentation Group
0910 Geräte für Ionenimplantation und Halbleiterdotierung
Applicant Institution
Ruprecht-Karls-Universität Heidelberg
