Automated and high throughput electron beam lithography system

• Subject Area: Materials Engineering
• Term: Funded in 2024
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 536597994

Leibniz Universität Hannover contributes significantly to the establishment and strengthening of quantum research and optical technologies at the research location Germany within the framework of the excellence clusters Quantum Frontiers and PhoenixD, in the research association Quantum Valley Lower Saxony as well as in numerous research projects. The scale of the researched structures and devices reaches into the single-digit nanometer range. Lithography processes are used as the structuring method. The existing range of equipment offers the possibility of economical but low-resolution structuring by means of laser lithography or mask-based photolithography. Alternatively, there is the option of high-resolution but uneconomical electron beam lithography, which is therefore limited to very small areas, using converted scanning electron microscopes. The latter option is therefore primarily suitable for concept validation and prototype-based manufacturing, but there is no use for it in a production engineering context. In addition to the structure size itself, line fidelity is essential, since masking is transferred 1:1 into the material in subsequent process steps, which manifests itself in sidewall roughness. This has a negative effect on the propagation of light in waveguides in photonic applications and on the homogeneous formation of the induced light in conductors in quantum optical applications. For the reasons mentioned above, the procurement of an automated and high-throughput electron beam lithography system (EBL) is therefore envisaged. Such a device enables, among other things, the development of novel measurement and sensor concepts based on photonic systems, dedicated semiconductor systems, nanostructures as well as quantum-manipulated atomic and molecular ensembles within the framework of the Clusters of Excellence. Since the system is intended to be accessible to a large number of users, ergonomics and the degree of automation are the primary considerations in selecting a suitable system. While one person will be responsible for the actual system operation, users should be able to create individual exposure tasks using automated workflows and an accessible human-machine interface. Users will take into account the geometric constraints of manufacturing, but need not have deep expertise in using the EBL system itself. In the context of cost-effectiveness, multi-user operation should be possible in that up to eight different users can place their exposure jobs in one exposure process. Process parameters such as focusing, height leveling and writing field calibration shall be automatic. After production, the EBL system shall perform automated measurements for process control.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Automatisiertes und durchsatzstarkes Elektronen-Strahllithografie-System
• Instrumentation Group: 0910 Geräte für Ionenimplantation und Halbleiterdotierung
• Applicant Institution: Gottfried Wilhelm Leibniz Universität Hannover
• Leader: Professor Dr.-Ing. Marc Christopher Wurz