Interval observer design methods for substrate monitoring of reactive sputtering

• Applicant: Dr.-Ing. Christian Wölfel
• Subject Area: Automation, Mechatronics, Control Systems, Intelligent Technical Systems, Robotics
• Term: since 2025
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 562363182

Reactive sputtering processes are used for the plasma-based deposition of nanostructured films on substrate surfaces. The properties of the deposited thin film cannot be measured during the coating process. The aim of the project is to apply the principle of state feedback to reconstruct the surface condition online based on modern sensors. The concept of interval observation is to be further developed for a class of quasi-linear parameter varying process models to consider uncertainties in the process parameters and measured variables. The use of the newly developed multipole resonance probe enables the measurement of the plasma density as an important source of information on the process status. As a basis for the method development, a new monitoring-oriented process model must be developed and analyzed from a systems theory perspective. The new process model and the developed design methods are to be validated experimentally on a research reactor to be able to assess their practical effectiveness.

• DFG Programme: Research Grants