Ion-Beam Patterning System (IBP)

• Subject Area: Electrical Engineering and Information Technology
• Term: Funded in 2026
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 568740739

With the ion-beam patterning system (IBP), direct etching using lithium, gallium, or bismuth ions allows nanoscale components and functional surfaces to be prototyped quickly and with unprecedented precision. It enables direct FIB patterning or subsequent trimming of already generated nanostructures. In addition to direct milling, the device can also be used for doping or finely tuned changes to the morphology of components. Applications include the direct patterning of nanoscale devices such as superconducting electronics, magnetic sensors, 3D electrodes with high aspect ratio, as well as trimming and functionalization of components by modifying their size, shape, morphology, crystallinity, or composition. The system is embedded in the Central Electronics and Information Technology Laboratory (ZEITlab) at the Technical University of Munich (TUM). The ZEITlab is an organizational unit of the School of Computation, Information and Technology (SoCIT). Since 2022, it has been housed in the new TUM Electrical Engineering and Information Technology building on the Garching campus. The center consists of a clean room with an area of 950 m² and associated characterization laboratories. Its vision is to establish a "makerspace for microelectronics prototypes" that supports a wide range of research areas as a broad-based technology center of SoCIT. In the ZEITlab, proof-of-concept demonstrators in the field of electronics and sensor technology are realized on the basis of modern materials and components and made available for various fields of application. This type of "rapid prototyping" uses innovative processing and characterization technologies and is systematically supplemented by circuit design and modelling. ZEITlab provides a central and shared access to micro- and nanofabrication for a large number of research groups working on topics such as quantum and sensor technologies, micro-, opto-, and neuroelectronics, as well as hybrid nanosystems. The bundled infrastructure, therefore, enables an efficient transfer of technologies from basic research to engineering issues and applications.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Ion-Beam Patterning System
• Applicant Institution: Technische Universität München (TUM)
• Leader: Professor Dr.-Ing. Markus Becherer