Setup for the microwave plasma assisted chemical vapour deposition of diamond films

• Subject Area: Molecular Chemistry
• Term: Funded in 2026
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 577212884

The production of highly defined diamond films is of importance for a variety of research fields such as electrochemistry, catalysis, sensing and quantum science. Typically, these diamond films are produced using chemical vapor deposition of volatile carbon precursors on different substrates ranging from silicon via different metallic substrates to diamond. Diamond possesses a broad range of unique properties besides its mechanical and chemical stability. For instance, the negative electron affinity of its surface allows for the barrier free emission of electrons into the surrounding medium upon their photo(electro)excitation into the conduction band. Furthermore, the possibility of doping with different elements enables the use of diamond in electrochemical and electronic applications, such as electrosynthesis, chemical and biological sensing and energy storage. In quantum technology, diamond has also become a highly attractive material. Therefore, the production of tailored diamond materials for these different fields of application is a fundamental requirement for research. This proposal aims to acquire and install a new, state-of-the-art chemical vapor deposition setup for the growth of boron-doped diamond films for the use in investigations in the fields of catalysis, sensing, quantum science, and energy storage. It will be used to grow tailored diamond materials for the production of continued diamond films, micro- and nanostructured films with and without pores, as well as for the production of diamond particles of different size and morphology. To this end, different methods for the deposition of diamond films on unusual growth substrates, for the incorporation of different levels of boron and of co-dopants will be developed. The setup will enable the growth of very homogeneous diamond layers with dimensions up to 4” (~12 cm), which will render it compatible with semiconductor processing equipment in the clean room. The choice of a microwave plasma assisted growth mechanism allows for high growth rates, high reproducibility of materials properties and full control over the sp2 content and grain size in polycrystalline films by using an ellipsoidal shape of the plasma ball. The resulting materials will be used in various applications, such as in photocatalysis for different types of reactions such as CO2 reduction, N2 activation, challenging organic reductions as well as the decomposition of pollutants. Additionally, the use as electrodes for sensing applications in biomedical contexts will be explored. Furthermore, the control of color centers in diamond by overgrowth on diamond with, e.g. NV centers with microstructures of boron-doped diamond will be enabled.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Anlage zur Mikrowellenplasma-unterstützten chemischen Gasphasenabscheidung von Diamantfilmen
• Instrumentation Group: 8330 Vakuumbedampfungsanlagen und -präparieranlagen für Elektronenmikroskopie
• Applicant Institution: Universität Stuttgart
• Leader: Professorin Dr. Anke Krüger