Optical Metrology System

• Subject Area: Optics, Quantum Optics and Physics of Atoms, Molecules and Plasmas
• Term: Funded in 2020
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 453679893

We propose an Optical Metrology System as one of three main components of a modular Nanoproduction Facility. As integral part of the facility, the system will enable geometrical multi-scale and high-resolution measurements of 2D, 2.5D and 3D micro- and nanostructures. The metrology system includes five modalities, (i) interference microscopy, (ii) thin film measurement, (iii) confocal microscopy, (iv) active illumination focus variation, and (v) atomic force microscopy, incorporated in one off-line module. It will be used for precisely measuring the structure geometries, dimensions, feature sizes and surface roughness. Within the modular Nanoproduction Facility, the Optical Metrology System will be used for the measurement and characterization of 2D, 2.5D, and 3D micro- and nanostructures realized using both a Laser Nanofabrication System based on two-photon polymerization (TPP) and a Nanoimprint Lithography System (UV-NIL). All modules will be implemented in a multi-scale production chain for the realization of various integrated optical elements, subsystems, and entire functional systems for a variety of applications ranging from optical networks over monitoring and sensing to imaging and metamaterials.The proposed Optical Metrology System - and ultimately the modular Nanoproduction Facility - provides a combined production and characterization environment and will be broadly utilized by the groups of the four main users and a number of additional collaborators. It will be located in a common infrastructure for optimal access and operation. One research group of the applicants will organize operation and service. The requested system is currently not available in the groups of the planned users.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Optisches Metrologiesystem
• Instrumentation Group: 0910 Geräte für Ionenimplantation und Halbleiterdotierung
• Applicant Institution: Gottfried Wilhelm Leibniz Universität Hannover
• Leader: Professor Dr. Bernhard Roth