Plasma diagnostics of pulsed microwave plasmas with HF-bias combined with plasma-enhanced atomic layer deposition for the deposition of multilayer SiOx gradient coatings as barrier coating of flexible polymers (B04)

• Subject Area: Optics, Quantum Optics and Physics of Atoms, Molecules and Plasmas
• Term: from 2010 to 2022
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 138690629

The fundamental mechanisms during the deposition of barrier coatings on polymers, by means of a pulsed microwave driven discharge and a variable HF bias, are investigated, employing thin film analysis and quantitative plasma diagnostics. Ion energies and the flux of reactive species are controlled by varying the HF bias. Furthermore, plasma enhanced atomic layer deposition (PEALD) and combined atomic layer and molecular layer depositions (ALD/MLD) are performed to deposit highly homogeneous oxide and hybrid coatings for gas barrier and membrane applications. In this regard, functional properties are tuned by variation of the deposition process and precursor chemistry.

• DFG Programme: CRC/Transregios
• Subproject of: TRR 87: Pulsed High Power Plasmas for the Synthesis of Nanostructural Functional Layers
• Applicant Institution: Ruhr-Universität Bochum
• Project Heads: Professor Dr.-Ing. Peter Awakowicz; Professorin Dr. Anjana Devi, since 7/2014