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Projekt Druckansicht

InAs-based nanowires on silicon platform for novel nanoscale high electron mobility heterojunction devices

Fachliche Zuordnung Experimentelle Physik der kondensierten Materie
Förderung Förderung von 2012 bis 2016
Projektkennung Deutsche Forschungsgemeinschaft (DFG) - Projektnummer 212579533
 
Erstellungsjahr 2017

Zusammenfassung der Projektergebnisse

Within this project, important fundamental knowledge could be gained about the electronic properties and electrical transport characteristics of III-V based nanowires (NW) integrated on silicon (Si). Based on extensive growth optimization studies of catalyst-free InAs and InGaAs NWs we were able to tune many intrinsic parameters, such as size, alloy composition, defect and surface state densities and interface quality of the relevant NW charge carrier channel. The impact of these parameters was reflected in the transport characteristics of fabricated NW- FETs, as well as in heterojunction devices such as NW/Si tunnel diodes. Excellent Esaki diode characteristics with high peak-to-valley current ratios and very high tunnel currents across n- InAs-NW/p++-Si heterojunctions were obtained, providing promising building blocks for vertically integrated NW-Si tunneling FETs. In addition, we explored the concept of modulation doping in radial core-shell NW heterostructures to obtain high-electron mobility NW transistor devices. We successfully demonstrated for the first time in III-V-based NW-FETs the formation of a high-mobility two-dimensional electron gas (2DEG) that further enabled observation of excellent dc output and transfer characteristics with sub-threshold slopes close to the theoretical limit. These concepts have proven to be versatile nanoscale systems that shall be further exploited for nanoelectronic applications in future research.

Projektbezogene Publikationen (Auswahl)

 
 

Zusatzinformationen

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