UHV Sputteranlage

• Fachliche Zuordnung: Werkstofftechnik
• Förderung: Förderung in 2015
• Projektkennung: Deutsche Forschungsgemeinschaft (DFG) - Projektnummer 269836337

The present proposal applies for a UHV sputter system to create precursor metal and alloy films for the growth of highly defined anodic oxide nanostructures. We will generate gradient metals, metastable alloys and defined superlattice structures to provide otherwise not or only hardly achievable thin film metal alloys and structures (gradients, stacks). The films will be produced on several substrate materials like transparent conductive oxides, silicon or metal back-contacts. The deposited metals will be converted via anodic oxidation into self-ordered metal oxide semiconductors in nanotubular form designed for various applications. For example, the use as photocatalytic light absorber and energy converter makes these layers highly interesting, e.g., in specific photocatalytic reactions. By applying additionally co- and gradient-sputtering, virtually endless possibilities to create band-gap engineered tailored electrodes for water-splitting, solar-, storage- and energy devices are possible.

• DFG-Verfahren: Forschungsgroßgeräte
• Großgeräte: UHV Sputteranlage
• Gerätegruppe: 8330 Vakuumbedampfungsanlagen und -präparieranlagen für Elektronenmikroskopie
• Antragstellende Institution: Friedrich-Alexander-Universität Erlangen-Nürnberg
• Leiter: Professor Dr. Patrik Schmuki