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Projekt Druckansicht

Hochbrilliante GaN Laserdioden

Fachliche Zuordnung Experimentelle Physik der kondensierten Materie
Förderung Förderung von 2018 bis 2023
Projektkennung Deutsche Forschungsgemeinschaft (DFG) - Projektnummer 391920327
 
Erstellungsjahr 2023

Zusammenfassung der Projektergebnisse

During the project, important epitaxy-related challenges towards the realization of nitride-based highbrightness lasers have been resolved. A general vertical waveguide structure resulting in tremendously reduced mode divergence of only 10 degrees has been demonstrated as epitaxially grown layer stack including electrical operation mode as LED. Very low resistivities for Ge-doped InAlN/GaN mutiple layer stacks and thick, highly reflecting DBR structures have been achieved. Homoepitaxially grown GaN:Ge/GaN:Mg tunnel junctions have reached a status in LED where virtually no bias offset is observed with respect to conventional ITO contacts. Such tunnel contacts open new possibilities towards fully symmetrical waveguide structures with large mode volume. Our recently developed rapid prototyping for laser diode fabrication enables our own attempts to realize the first GaN_based PBC laser in the near future. We are now planning to implement successively all developed technologies – highly conductive n-type InAlN/GaN waveguide structures and GaN:Ge/GaN:Mg tunnel junctions which will open up a complete novel perspective for nitrdie-based laser diodes with reduced far-field divergence and therefore high brilliance.

Projektbezogene Publikationen (Auswahl)

 
 

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