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High-brightness GaN laser diodes

Subject Area Experimental Condensed Matter Physics
Term from 2018 to 2023
Project identifier Deutsche Forschungsgemeinschaft (DFG) - Project number 391920327
 
Final Report Year 2023

Final Report Abstract

During the project, important epitaxy-related challenges towards the realization of nitride-based highbrightness lasers have been resolved. A general vertical waveguide structure resulting in tremendously reduced mode divergence of only 10 degrees has been demonstrated as epitaxially grown layer stack including electrical operation mode as LED. Very low resistivities for Ge-doped InAlN/GaN mutiple layer stacks and thick, highly reflecting DBR structures have been achieved. Homoepitaxially grown GaN:Ge/GaN:Mg tunnel junctions have reached a status in LED where virtually no bias offset is observed with respect to conventional ITO contacts. Such tunnel contacts open new possibilities towards fully symmetrical waveguide structures with large mode volume. Our recently developed rapid prototyping for laser diode fabrication enables our own attempts to realize the first GaN_based PBC laser in the near future. We are now planning to implement successively all developed technologies – highly conductive n-type InAlN/GaN waveguide structures and GaN:Ge/GaN:Mg tunnel junctions which will open up a complete novel perspective for nitrdie-based laser diodes with reduced far-field divergence and therefore high brilliance.

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