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Basic properties of ternary group III nitride compound semiconductor non-polar surfaces

Subject Area Experimental Condensed Matter Physics
Term from 2018 to 2022
Project identifier Deutsche Forschungsgemeinschaft (DFG) - Project number 398305088
 
Final Report Year 2023

Final Report Abstract

Semiconductor devices based on wurtzite structure group III-nitrides require ternary (Al,Ga,In)N compounds in order to achieve the desired materials properties. However, these ternary alloys are not lattice matched to trhe existing substrates with the exception of Al0.81In0.19N/GaN, which is almost matching. Furthermore, growth on non-polar surfaces of ternary nitrides offers the prospect to grow polarization free heterojunctions. Since the growth is directly affected by the surface properties, the aim of the current project was to investigate the basic electronic and structural properties of non-polar surfaces of ternary nitride semiconductors. During the project the composition dependent changes of the intrinsic surfaces states were determined for (Al,Ga)N, the doping dependence of the interplay of extrinsic and intrinsic states leading to a Fermi-level pinning, and the effect of hydroxylation during air exposure. In addition, we developed a methodology to determine polarization changes and electron affinity changes quantitatively at heterointerfaces, based on the calibration of electron holography in transmission electron microscopy. This was demonstrated for Al,Ga)N/GaN and (In,Ga)N/(Al,Ga)N interfaces, where an anomalous strain relaxation was correlated with an polarization change minimization.

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