Development and realisation of a 3D nanolithography and nanomeasuring machine for the measurement and structuring of most advanced optical elements in a range of 1000 mm x 1000 mm x 200 mm with subnanometer precision

• Applicants: Professor Dr.-Ing. Thomas Fröhlich; Professor Dr. Thomas Kissinger; Professor Dr. Andreas Tünnermann; Professor Dr. Uwe Zeitner
• Subject Area: Automation, Mechatronics, Control Systems, Intelligent Technical Systems, Robotics
• Term: since 2026
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 556122658

Over the last two decades, nanostructures have become an essential key to mastering technological challenges in many applications, from the production of highly integrated electronic circuits, measurement technology and sensor technology in cars to high-performance optics for space missions for earth observation and basic research. In addition to high precision, the size of optically nanostructured elements that can be realized with reasonable effort is a decisive parameter for many applications. The production of such components with dimensions of up to around 300 mm is currently mastered using various technologies. Beyond these dimensions, there are currently no adequate manufacturing and testing methods. As part of the DFG program "New Devices for Research", the applicants have therefore set themselves the goal of jointly developing and building a 3D nanolithography and nanomeasuring machine (3D-NLM machine) with a processing and measuring range of 1 m x 1 m x 0.2 m with a positioning structuring and measuring accuracy down to the sub-nanometer range, which, through the consistent combination of highly developed 3D nanolithography (IAP/FSU Jena, Fraunhofer IOF) with extremely precise nanopositioning and nanomeasurement technology (IPMS/TU Ilmenau), will enable unprecedented performance at the limits of physics and technical feasibility. This internationally unique approach will enable the consortium to research, develop and manufacture novel high-tech components. In order to realize the extremely high accuracy requirements (resolution: 20 pm, relative resolution: 2*10-11, max. structuring deviation: < 10 nm on a 3D surface of 1 m2) of the novel 3D-NLM machine with the enormous geometric dimensions and masses, a whole series of original approaches are to be used, which are unique in this complex form worldwide and in which all three partners involved and in particular the IPMS of the TU Ilmenau can refer to an internationally unique position and high level of expertise. These include laser frequency stabilization on a GPS atomic clock-disciplined frequency comb and thus the permanent traceability of the unit of length to the second, active refractive index stabilization to < 10-10, the significant reduction of moving masses by applying the inverse kinematic concept when implementing the extended Abbe comparator principle, the permanent insitu measurement of the reference mirror surfaces to minimize temporal and thermal long-term effects and the realization of a nanolithography tool with highly parallelized, actively controllable exposure distribution. In the first project phase (3 years), based on the development of the overall concept, the main subsystems are to be developed, constructed and proof provided that the specified parameters have been achieved.

• DFG Programme: New Instrumentation for Research
• Major Instrumentation: AFM-System ; Datenerfassungs- und Regelsystem ; Interferenzoptische Messsysteme ; Messkammer ; Präzisionsantriebssysteme ; Referenzspiegel ; Schwingungsisolation ; Tastsystem Weißlichtinterferometer
• Instrumentation Group: 5091 Rasterkraft-Mikroskope ; 5300 Interferometer, Vielstrahl-Interferometer, Etalons ; 5310 Interferenzapparaturen, Zweistrahl-Interferometer ; 5920 Spiegel, Spiegel-Optik ; 6930 Elektrische Steuergeräte und Anlagen ; 8300 Labor-Vakuumeinrichtung ; 9450 Labortische und -aufbauten