Low-Pressure Reactor for Inductively Coupled Plasmas

• Subject Area: Optics, Quantum Optics and Physics of Atoms, Molecules and Plasmas
• Term: Funded in 2025
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 565403989

A novel low-pressure reactor is to be developed for the investigation of inductively coupled plasmas (ICPs) with substrate bias and tailored waveforms. The objective is to enhance the efficiency, selectivity, and particularly the sustainability of plasma etching processes. To date, inductively coupled plasmas for etching are almost exclusively operated with time-harmonic voltages, significantly limiting process control. By applying a non-harmonic voltage to the coil of the plasma reactor, the energy input into the plasma can be adjusted to enable precise control of the generation of reactive species critical for etching processes through manipulation of the electron energy distribution function. Simultaneously applying a non-harmonic waveform to the substrate bias is expected to result in higher selectivity and increased etch rates at the same power input. This approach significantly reduces energy consumption and decreases the emission of climate-damaging process gases, such as sulfur hexafluoride (SF6) and tetrafluoromethane (CF4). The diagnostic systems included in the proposed setup allow for fundamental investigations of electron dynamics, plasma density, electron and ion energy distributions, and the densities and fluxes of all radicals relevant to etching processes. Most measurements facilitated by these diagnostic tools are spatially and temporally resolved, enabling in-depth insights into fundamental plasma processes. Thus, the system supports the development and exploration of sustainable plasma processes.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Niederdruck-Reaktor für induktiv gekoppelte Plasmen
• Instrumentation Group: 8390 Sonstige Vakuumgeräte und -anlagen (außer 830-838)
• Applicant Institution: Ruhr-Universität Bochum
• Leader: Professor Dr.-Ing. Thomas Mussenbrock