Laser lithography system

• Subject Area: Materials Science
• Term: Funded in 2025
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 569551455

The project aims to install a maskless optical lithography system in the DFG core facility Kieler Nanolabor. This is realized by a direct laser writing system that offers the greatest possible flexibility with regard to the resists to be exposed by being equipped with two UV sources of the wavelengths 375 nm and 405 nm. The laser exposure unit enables structural resolutions down to the 300 nm size range and greyscale lithographic applications. The LASER writer is used in more than 20 scientific projects, for example for the fabrication of surface wave sensors with center frequencies in the GHz range, memristive devices for neuromorphic systems, as well as 2.5-dimensional microfluidic systems for lab-on-chip devices and periodic magnetic structures in the submicrometer range for research of magnonic structures.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Laser-Lithographie System
• Instrumentation Group: 0910 Geräte für Ionenimplantation und Halbleiterdotierung
• Applicant Institution: Christian-Albrechts-Universität zu Kiel
• Leader: Dr. Dirk Meyners