Inductively coupled plasma-enhanced chemical vapor deposition

• Subject Area: Optics, Quantum Optics and Physics of Atoms, Molecules and Plasmas
• Term: Funded in 2026
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 574723012

To fabricate high-quality material films with precisely defined layer thicknesses in the nanometer to micrometer range, a chemical vapor deposition system is to be installed in the cleanroom of the European Institute for Neuromorphic Computing. In order to produce films with high purity and density and minimal pinholes, the system will be equipped with an inductively coupled plasma source. The planned system will enable the targeted deposition of dielectric thin films with tunable optical properties and precisely controllable layer thicknesses through in-situ monitoring. The system is being applied for in connection with the appointment of W. Pernice at Heidelberg University, with the aim of supporting the research activities of his group and stimulating new research initiatives in the areas of nanotechnology, quantum technology, and molecular systems engineering. The system is intended to be used for the deposition of high-quality dielectric layers for optical passivation, optical waveguides, multilayer systems, and hard masks for high-resolution lithography. Within the scope of the research activities, silicon dioxide, silicon nitride, amorphous silicon, and diamond-like carbon films will be optimized and deposited using the new equipment. A comparable system is currently not available at Heidelberg University. The acquisition of this system will therefore optimally complement the existing nanofabrication infrastructure. The available nanofabrication facilities at the Kirchhoff Institute for Physics, the European Institute for Neuromorphic Computing, and the Institute for Molecular Systems Engineering and Advanced Materials are also used by other research groups, including teams from the Institute of Physics, the Institute of Computer Engineering, and the Excellence Clusters STRUCTURES and 3DMM2O. As a multi-user system, the device will be made available to a broad user community, significantly expanding and sustainably strengthening the capabilities for high-precision nanofabrication at Heidelberg University.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Induktiv gekoppelte plasma-unterstützte chemische Gasphasenabscheidung
• Instrumentation Group: 0920 Atom- und Molekularstrahl-Apparaturen
• Applicant Institution: Ruprecht-Karls-Universität Heidelberg
• Leader: Professor Dr. Wolfram Hans Peter Pernice