Renewal of a UHV evaporation system

• Subject Area: Electrical Engineering and Information Technology
• Term: since 2026
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 584948828

Since its establishment in 1988, the Chair of Semiconductor Technology has been engaged in the conceptual development and technological implementation of novel electronic and optoelectronic components based on III/V compound semiconductors. All components are metallized in a ultra-high-vacuum (UHV) vapor deposition system that dates back to the department's initial equipment and, despite its age, is still used on a daily basis. This system has a number of special features that make it difficult for the department to replace: • Option to tilt and rotate samples (ideal for covering edges), • Ultra-high vacuum system including cooling with LN2 (low base pressure), • Lock chamber for high sample throughput. However, failures of the electron beam evaporator are now becoming more frequent, which is why the entire system is to be overhauled. The central element of this application is the renewal of the electron beam evaporator, including the corresponding power supply and the software for controlling the process sequences. In addition, the getter elements of the ion getter pumps integrated into the vacuum chamber (the only pumps in the deposition chamber) must be overhauled and their control system renewed. Finally, the motors of the rotation and tilting unit should also be replaced. This would ensure that the system is well equipped to continue serving for many years to come.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Erneuerung einer UHV-Aufdampfanlage
• Instrumentation Group: 0920 Atom- und Molekularstrahl-Apparaturen
• Applicant Institution: Technische Universität München
• Leader: Professor Mikhail Belkin, Ph.D.