Understanding and controlling the deposition of semiconductor films by electrochemical approaches (C04)

• Subject Area: Solid State and Surface Chemistry, Material Synthesis ; Physical Chemistry of Solids and Surfaces, Material Characterisation
• Term: since 2025
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 538767711

Project C4 (Ng) utilizes electrochemical techniques in a liquid environment to investigate the growth and properties of films and structures. Atomic force - scanning electrochemical microscopy (AFM-SECM) will provide insight into the growth and defect formation of 2D semiconductors. We will start with g/sALD TMDCs (C1) and exfoliated 2D TMDC layers (S4), followed by organic molecules and functionalized layers (C2, C3, F5). We explore the influence of defects and structural features toward (photo)electrochemical reactions and (photo)degradation of the semiconducting layers (complementing C5, S1) and testing models of film growth and defect formation (C5, C6, S2-S5, F1, M1-M4).

• DFG Programme: Collaborative Research Centres
• Subproject of: SFB 1719: Next-generation printed semiconductors: Atomic-level engineering via molecular surface chemistry
• Applicant Institution: Friedrich-Alexander-Universität Erlangen-Nürnberg
• Project Head: Professorin Dr. Siow Woon Ng, Ph.D., since 7/2025