FOR 365:  Particle Beam Stimulated Ultra-Precision Surface Processing

• Subject Area: Computer Science, Systems and Electrical Engineering
• Term: from 1999 to 2007
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 5466172

Surface finishing requirements with respect to surface shape accuracies of better than 0.25 nm rms and micro-roughness lower than 0.2 nm rms for plane, spherical and future aspherical surfaces (e.g. for the optics for EUVL - extreme ultraviolet lithography) and for 3D-microstructures cannot be achieved by conventional mechanical and chemo-mechanical processing techniques alone. Therefore alternative techniques like ion beam and local plasma-(jet) technologies gain growing interest in surface processing with tolerances in the nanometer and sub-nanometer range for surface figuring, smoothing, 3D-micro-structure fabrication and ultra-smooth thin films. Thereare strong international R&D efforts to develop technologies mature for industrial applications. In Germany the BMBF is funding joint projects between industry, institutes and universities in the frame of the so called Centers of Competence in Nanotechnology, namely CC-UPOB (ultra-precision processing) and CC-UFS (ultra-thin functional layers). The timeline for the nanometer tolerance technology development is very demanding, resulting in the as early as possible practical exploitation of the technical achievements of the technologies, the new equipment or products often at a time when the knowledge of basic phenomena of those techniques is incomplete or even unclear with the consequence of insufficient basic knowledge forfurther developments or technology improvements, respectively. The research unit 365 contributes on the one hand to reduce the deficit in basic knowledge especially in the field of already existing or to aim at industrial exploitations of low energy ion beam and plasma jet technologies for local large area precision surface shaping and smoothing, for material deposition for optoelectronic emitting elements and for a better parameterization of the ion beam sources as the main tools for this kind of technology. On the other hand the research group performs targeted research for new applications of surface processing by low energy ion beam and plasma jet material removal and deposition for 3D-micro-structure fabrication usingreplica techniques with the imprint technology and for ion beam assisted wafer direct bonding of III-V compounds.

• DFG Programme: Research Units
• International Connection: Belgium

Projects

• Anwendungsspezifischer Einsatz von 3D-Replikationstechniken (Applicant Mehnert, Reiner )
• Anwendungsspezifischer Einsatz von 3D-Replikationstechniken (Applicant Scheer, Hella-Christin )
• Ion and plasma-enhanced proportional transfer of 3D-structures in the micrometer- and sub-micrometer-range (Applicant Tünnermann, Andreas )
• Ionen- und plasmagestützte Übertragung dreidimensionaler Strukturen im µm- und Sub-µm-Bereich (Applicant Zimmer, Klaus )
• Ionenstrahlgestütztes Direktbonden herterogener Materialien (Applicant Gottschalch, Volker )
• Ionenstrahlgestütztes Direktbonden heterogener Materialien (Applicant Schindler, Axel )
• Mechanismen und Dynamik der lokalen Plasma-Jet Oberflächenbearbeitung (Applicant Wagner, Hans-Erich )
• Mechanismen und Dynamik der lokalen Plasma-Jet Oberflächenbearbeitung (Applicant Schindler, Axel )
• Mikrooptiken und -strukturen in III-V-Halbleiterschichtanordnungen: Effiziente Oberflächenemitter mit horizontaler Kavität (Applicant Schindler, Axel )
• Mikrooptiken und -strukturen in III-V-Halbleiterschichtanordnungen: Effiziente Oberflächenemitter mit horizontaler Kavität (Applicant Gottschalch, Volker )
• Mikrooptiken und -strukturen in III-V-Halbleiterschichtanordnungen: Grundlagenuntersuchungen und Anwendungen (Applicant Gottschalch, Volker )
• Oberflächenglättung im Sub-Nanometer-RMS-Bereich durch (reaktives) Ionenstrahlätzen (Applicant Frost, Frank )
• Optimization and shaping of ion beam density profiles for the high-precision surface processing (Applicant Hartmann, Eberhard )
• Quantenchemische Untersuchungen zu Bildung, Stabilität sowie strukturellen und elektronischen Eigenschaften von GaBAs- und GalnBAs-Mischkristallen (Applicant Schindler, Axel )

• Spokesperson: Privatdozent Dr. Axel Schindler